POWER MOSFET SEMICONDUCTOR

专利名称：POWER MOSFET SEMICONDUCTOR发明人：Oliver Haeberlen,Joachim Krumrey,Franz

Hirler,Walter Rieger

申请号：US14935877申请日：20151109

公开号：US20160233331A1公开日：20160811

专利附图：

摘要：A semiconductor device includes a source metallization, a source region of afirst conductivity type in contact with the source metallization, a body region of a secondconductivity type which is adjacent to the source region. The semiconductor device

further includes a first field-effect structure including a first insulated gate electrode anda second field-effect structure including a second insulated gate electrode which iselectrically connected to the source metallization. The capacitance per unit area betweenthe second insulated gate electrode and the body region is larger than the capacitanceper unit area between the first insulated gate electrode and the body region.

申请人：Infineon Technologies Austria AG

地址：Villach AT

国籍：AT

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