Radiation sensitive composition

专利名称：Radiation sensitive composition发明人：Takashi Takeda申请号：US08/9553申请日：19971021公开号：US05962187A公开日：19991005

摘要：A radiation sensitive composition containing resist materials such asquinonediazido photo active compound and alkali soluble resin, and a mixed solventcomprising (A) 1 to 25% by weight of propylene glycol derivatives as represented by theformula:

R.sub.1 --O-- CH.sub.2 CH(CH.sub.3)--O--R.sub.2

wherein R.sub.1 and R. sub.2 are hydrogen atom, alkyl group having 2 to 5 carbons andacetyl group, and total number of carbons in R.sub.1 and R.sub.2 is less than 8, both theR.sub. 1 and R.sub.2 are not hydrogen atom at the same time, and (B) 75 to 99% byweight of at least one kind of solvent selected from propylene glycol monomethyl etheracetate and ethyl lactate. The radiation sensitive composition is used for the

manufacturing of semiconductor device and liquid crystal display element. The solvent issafe to human body and the amount of residual solvent in the resist film is small.

申请人：CLARIENT INTERNATIONAL LTD.

代理机构：Foley & Lardner

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