专利名称：Resist material发明人：今田 知之,長江 教夫申请号：JP2018018161申请日：20180205公开号：JP2019135279A公开日：20190815
摘要：Subject Problem to be solved: to provide a resist material excellent in heatresistance and dry etching resistance. Solution It is characterized by containing an epoxycompound (a) having a dinaphthylalkane structure and a hydroxynaphthalene BOAC typephenol resin (b), preferably for 1 mole of all phenolic hydroxyl groups in the resistmaterial The resist material is in the range of 0.01 to 0.8 mole of the total epoxy group inthe Diste material.The resist material has excellent heat resistance and dry etchingresistance.No selection
申请人：ＤＩＣ株式会社
地址：東京都板橋区坂下３丁目３５番５８号
国籍：JP
代理人：小川 眞治,岩本 明洋,大野 孝幸
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