COMPOUND IMAGING METROLOGY TARGETS

专利名称：COMPOUND IMAGING METROLOGY

TARGETS

发明人：YOHANAN, Raviv,AMIT, Eran,GHINOVKER,

Mark,ITZKOVICH, Tal,AMIR, Nuriel

申请号：US2015/036825申请日：20150619

公开号：WO2015/196168A1公开日：20151223

专利附图：

摘要：Imaging metrology targets and methods are provided, which combine 1Delements designed to provide one-dimensional (1D) imaging metrology signals along at

least two measurement directions and 20 elements designed to provide at least one two-dimensional (2D) imaging metrology overlay signal. The target area of the 1D elementsmay enclose the 2D elements or the target areas of the 1D and 2D elements may bepartially or fully congruent. The compound targets are small, possible multilayered, andmay be designed to be process compatible (e.g., by segmentation of the elements,interspaces between elements and element backgrounds) and possibly be produced indie. 2D elements may be designed to periodic to provide additional one dimensionalmetrology signals.

申请人：KLA-TENCOR CORPORATION

地址：95035 US

国籍：US

代理人：MCANDREWS, Kevin et al.

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